Currently, the vast majority of domestic and imported production line magnetron sputtering target products are based on single plated film and the metal film based solar control coated glass. These products process is relatively simple hollow lowe glass specifications, low equipment requirements. Thus, these lines can not meet plated LOW-E glass requirements. 97% solar radiation energy is concentrated in the wavelength range within 0.3-2.5um, this part of the energy from the outside; radiant energy below 100 ℃ object 2.5um more focused on the long wavelength, which is part of the energy mainly from the interior. Vertical production process lowe glass, placed vertically on a shelf lowe glass color, into the order of 10-1 Pa vacuum environment, which leads to an appropriate amount of process gas (inert gas Ar or reactive gases O2, N2), and keep the degree of vacuum stability. The target Ag, Si, etc. embedded in the cathode, and the cathode placed in a magnetic field perpendicular to the horizontal direction so as to constitute the magnetron target. Cathode magnetron target, with a DC or AC power, the role of high voltage, the process gas is ionized, forming a plasma.